DocumentCode
2139017
Title
PMOS device performance improvement using buried contact implants
Author
Qin, Shuang ; McDaniel, Troy ; Liu, L.J. ; Burke, Robin ; Hu, Yongjun Jeff ; McTeer, Allen ; Pun, B. ; Mitkova, M. ; Miranda, Paulo ; Zoller, R. ; Seibert, Matthias ; Latif, Muhammad Rizwan ; Mitkova, M. ; Ailavajhala, Mahesh S. ; Chen, Peng ; Mitkova, M.
Author_Institution
Micron Technol., Inc., Boise, ID, USA
fYear
2012
fDate
20-20 April 2012
Firstpage
1
Lastpage
2
Abstract
This Poster Session discusses the following: PMOS Device Performance Improvement using Buried Contact Implants; Deep Trench Patterning and Lift-off Resist in Micro-fluidic Devices; and Nano-ionic Conductive Bridge Memristors based on Chalcogenide Glasses: Electrical Performance Characterization and Modeling.
Keywords
MOSFET; chalcogenide glasses; integrated circuits; memristors; microfluidics; nanopatterning; 2012 IEEE workshop; PMOS device performance improvement; WMED; buried contact implants; chalcogenide glasses; deep trench patterning; electron devices; lift-off resist; micro-fluidic devices; microelectronics; nano-ionic conductive bridge memristors; poster session; Educational institutions; Glass; Implants; Performance evaluation; Sensors; Silver; USA Councils;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics and Electron Devices (WMED), 2012 IEEE Workshop on
Conference_Location
Boise, ID
ISSN
1947-3834
Print_ISBN
978-1-4577-1735-2
Type
conf
DOI
10.1109/WMED.2012.6202610
Filename
6202610
Link To Document