DocumentCode
2141546
Title
Low dissipation nanoscale transistor physics and operations
Author
Chi On Chui ; Shih, Kun-Huan ; Shoorideh, Kaveh
Author_Institution
Electr. Eng. Dept., Univ. of California, Los Angeles, CA, USA
fYear
2008
fDate
20-23 Oct. 2008
Firstpage
29
Lastpage
32
Abstract
Power dissipation has recently overtaken performance as the most important challenge in scaling nanoscale transistors. In this paper, we have proposed and preliminarily analyzed novel device concepts to reduce both the off-state leakage dissipation as well as the dynamic power consumption. The off-state leakage can be selectively suppressed using a wide bandgap drain heterojunction architecture. On the other hand, the dynamic power can be reduced using an asymmetric gate biasing scheme. We have also discussed the enabling device physics and operating principles.
Keywords
MOSFET; nanoelectronics; semiconductor heterojunctions; asymmetric gate biasing; dynamic power consumption; low dissipation nanoscale transistor; off-state leakage dissipation; power dissipation; wide bandgap drain heterojunction; Electron traps; MOSFET circuits; Medical simulation; Photonic band gap; Physics; Power dissipation; Semiconductor device doping; Substrates; Thermal management; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location
Beijing
Print_ISBN
978-1-4244-2185-5
Electronic_ISBN
978-1-4244-2186-2
Type
conf
DOI
10.1109/ICSICT.2008.4734468
Filename
4734468
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