• DocumentCode
    2141546
  • Title

    Low dissipation nanoscale transistor physics and operations

  • Author

    Chi On Chui ; Shih, Kun-Huan ; Shoorideh, Kaveh

  • Author_Institution
    Electr. Eng. Dept., Univ. of California, Los Angeles, CA, USA
  • fYear
    2008
  • fDate
    20-23 Oct. 2008
  • Firstpage
    29
  • Lastpage
    32
  • Abstract
    Power dissipation has recently overtaken performance as the most important challenge in scaling nanoscale transistors. In this paper, we have proposed and preliminarily analyzed novel device concepts to reduce both the off-state leakage dissipation as well as the dynamic power consumption. The off-state leakage can be selectively suppressed using a wide bandgap drain heterojunction architecture. On the other hand, the dynamic power can be reduced using an asymmetric gate biasing scheme. We have also discussed the enabling device physics and operating principles.
  • Keywords
    MOSFET; nanoelectronics; semiconductor heterojunctions; asymmetric gate biasing; dynamic power consumption; low dissipation nanoscale transistor; off-state leakage dissipation; power dissipation; wide bandgap drain heterojunction; Electron traps; MOSFET circuits; Medical simulation; Photonic band gap; Physics; Power dissipation; Semiconductor device doping; Substrates; Thermal management; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-2185-5
  • Electronic_ISBN
    978-1-4244-2186-2
  • Type

    conf

  • DOI
    10.1109/ICSICT.2008.4734468
  • Filename
    4734468