• DocumentCode
    2141581
  • Title

    Road-blocks to Tera-level nanoelectronics

  • Author

    Lee, Jo-Won ; Kim, Moonkyung

  • Author_Institution
    Nat. Program for Tera-level Nano Devices, Seoul, South Korea
  • fYear
    2008
  • fDate
    20-23 Oct. 2008
  • Firstpage
    37
  • Lastpage
    40
  • Abstract
    The national program for Tera-level Nanodevices (TND) serves as a frontier research resource to a broad range of nanoscale electronics areas. Outstanding nanoscale devices have been achieved and are being further developed using core technologies such as fast nanoscale molecular assembly, damage-free nano-etch process with a neutral beam and nano-rod and particle formation technology. Sub-30 nm scale nonvolatile memory arrays have been demonstrated by changing structures and materials. Using high quality heterojunction epitaxial growth technology, ultra high speed HEMT devices have been demonstrated with cut-off frequencies of approximately 610 GHz corresponding to gate length of 15 nm. Additionally, single electron transistor logic circuits have been extended to multi-valued static random access memory applications.
  • Keywords
    epitaxial growth; etching; high electron mobility transistors; logic circuits; nanoelectronics; single electron transistors; cut-off frequencies; damage-free nanoetch process; heterojunction epitaxial growth technology; multivalued static random access memory; nanorod; nanoscale molecular assembly; neutral beam; nonvolatile memory arrays; particle formation technology; single electron transistor logic circuits; teralevel nanodevices; teralevel nanoelectronics; ultrahigh speed HEMT devices; Assembly; Epitaxial growth; Heterojunctions; Molecular beam applications; Molecular beam epitaxial growth; Molecular beams; Nanoelectronics; Nanoscale devices; Nonvolatile memory; Particle beams;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-2185-5
  • Electronic_ISBN
    978-1-4244-2186-2
  • Type

    conf

  • DOI
    10.1109/ICSICT.2008.4734470
  • Filename
    4734470