DocumentCode :
2141645
Title :
An experimental study on carrier transport in silicon nanowire transistors: How close to the ballistic limit?
Author :
Wang, Runsheng ; Jing Zhuge ; Huang, Ru ; Zhang, Liangliang ; Kim, Dong-Won ; Zhang, Xing ; Park, Donggun ; Wang, Yangyuan
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
fYear :
2008
fDate :
20-23 Oct. 2008
Firstpage :
46
Lastpage :
49
Abstract :
In this paper, experimental studies on the carrier transport in silicon nanowire transistors (SNWTs) are reported, demonstrating their great potential as an alternative device structure for near-ballistic transport from top-down approach. Both ballistic efficiency and apparent mobility were characterized. A modified experimental extraction methodology for SNWTs is proposed, which takes into account the impact of quantum contact resistance. The highest ballistic efficiency is observed in sub-40 nm n-channel SNWTs due to their quasi-1D carrier transport. The apparent mobility is also extracted in comparison with the ballistic limit, which indicates that the gate-all-around SNWT can really be considered as a promising device architecture in close proximity to the ballistic transport.
Keywords :
ballistic transport; contact resistance; elemental semiconductors; nanoelectronics; nanowires; silicon; transistors; Si; ballistic efficiency; ballistic limit; near-ballistic transport; quantum contact resistance; quasi1D carrier transport; silicon nanowire transistors; top-down approach; Backscatter; Ballistic transport; CMOS technology; Capacitive sensors; Contact resistance; MOS devices; MOSFETs; Nanoscale devices; Silicon; Temperature dependence;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-2185-5
Electronic_ISBN :
978-1-4244-2186-2
Type :
conf
DOI :
10.1109/ICSICT.2008.4734473
Filename :
4734473
Link To Document :
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