DocumentCode :
2142968
Title :
Self-consistent modeling of higher pressure Microwave PACVD reactors
Author :
Meierbachtol, Collin S. ; Grotjohn, Timothy A. ; Shanker, Balasubramaniam
Author_Institution :
Dept. of Electr. & Comput. Eng., Michigan State Univ., East Lansing, MI, USA
fYear :
2012
fDate :
8-14 July 2012
Firstpage :
1
Lastpage :
2
Abstract :
Self-consistent simulation of Microwave PACVD reactors at higher pressures is challenging as it involves coupling many different physical phenomena that are highly nonlinear. This paper presents a solution for these problems. Two major components of the simulation include a finite-difference frequency domain (FDFD) electromagnetic model, and a steady-state convective plasma flow model. These two components are run concurrently while converging toward a single, self-consistent solution. To our knowledge, this is the first model to describe in detail the various physical, chemical, and thermal processes occurring during Microwave PACVD diamond film growth at higher pressures (up to 40% atmosphere). Detailed results and comparisons with experimental data will be presented at the conference.
Keywords :
chemical reactors; convection; finite difference methods; frequency-domain analysis; high-pressure techniques; plasma CVD; plasma flow; thin films; C; FDFD electromagnetic model; chemical processing; finite-difference frequency domain electromagnetic model; higher pressure microwave PACVD reactor; microwave PACVD diamond film growth; physical processing; self-consistent modeling; steady-state convective plasma flow model; thermal processing; Diamond-like carbon; Electromagnetic modeling; Hydrogen; Inductors; Mathematical model; Physics; Plasmas;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Antennas and Propagation Society International Symposium (APSURSI), 2012 IEEE
Conference_Location :
Chicago, IL
ISSN :
1522-3965
Print_ISBN :
978-1-4673-0461-0
Type :
conf
DOI :
10.1109/APS.2012.6348638
Filename :
6348638
Link To Document :
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