Title :
Manufacturing impedance control for high speed data link applications
Author :
Audet, Jean ; Na, Nanju ; Pharand, Sylvain ; Russell, David ; Lévesque, Réjean ; Leclerc, Robert-Paul
Author_Institution :
IBM Corp., Bromont, Que.
Abstract :
This paper discusses a new efficient monitoring method for impedance control using statistical impedance distribution generated from physical dimension data on line shape which are collected from manufactured products. In the method, statistical analysis is conducted on physical dimensions using randomly generated simulation data based on manufacturers\´ data, as well as measured data to predict potential impedance tolerance in a manufacturer\´s capability; this is used to "tune" the design accordingly
Keywords :
process control; process monitoring; statistical distributions; high speed data link; impedance tolerance; line shape; manufacturing impedance control; monitoring method; physical dimension data; statistical analysis; statistical impedance distribution; Dielectric substrates; Fabrication; Impedance measurement; Industrial control; Monitoring; Packaging; Semiconductor device measurement; Shape control; Statistical analysis; Virtual manufacturing;
Conference_Titel :
Electronic Components and Technology Conference, 2006. Proceedings. 56th
Conference_Location :
San Diego, CA
Print_ISBN :
1-4244-0152-6
DOI :
10.1109/ECTC.2006.1645779
