DocumentCode
2143533
Title
GaAs-GaP core-shell nanowire transistors: A computational study
Author
He, Yuhui ; Zhao, Yuning ; Fan, Chun ; Liu, Xiaoyan ; Kang, Jinfeng ; Han, Ruqi
Author_Institution
Inst. of Microelectron., Peking Univ., Beijing, China
fYear
2008
fDate
20-23 Oct. 2008
Firstpage
385
Lastpage
388
Abstract
We evaluate the performance of GaAs-GaP core-shell nanowire field effect transistors by employing a semiclassical ballistic transport model and a k·p calculation of the valence band structures including the strain effect. We find that the strain will induce substantial modulation on the nanowire valence band structures and this modulation will push more conduction channels into the bias window as the shell thickness increases. We analyze its impact on the transistor performance, and our simulation results indicate that in order to achieve a good ON/OFF current ratio the epitaxial shell should be grown thin enough.
Keywords
III-V semiconductors; field effect transistors; gallium arsenide; gallium compounds; nanowires; valence bands; GaAs-GaP; conduction channels; core-shell nanowire transistors; epitaxial shell; field effect transistors; k·p calculation; semiclassical ballistic transport; strain effect; valence band structures; Capacitive sensors; FETs; Gallium arsenide; III-V semiconductor materials; Lattices; Performance analysis; Semiconductor materials; Tensile strain; Tensile stress; Video recording;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location
Beijing
Print_ISBN
978-1-4244-2185-5
Electronic_ISBN
978-1-4244-2186-2
Type
conf
DOI
10.1109/ICSICT.2008.4734545
Filename
4734545
Link To Document