Title : 
Investigations on the physical understanding of mobility in MOSFETs - from drift-diffusion to quasi-ballistic
         
        
            Author : 
Liu, Hongwei ; Wang, Runsheng ; Huang, Ru ; Zhang, Xing
         
        
            Author_Institution : 
Inst. of Microelectron., Peking Univ., Beijing, China
         
        
        
        
        
        
            Abstract : 
This paper provides scattering matrix method to analyze the transport property in nanoscale MOSFETs. A unified mobility model with analytical expression is presented, which can cover the whole range from drift-diffusion to quasi-ballistic region. The inherent mobility reduction in MOSFETs with the shrinking of the channel length is extensively investigated from the theory and well agrees with the experiments, but the low-field free path is nearly constant. It is found that the reduction of measured mobility in nano-MOSFETs is only an apparent phenomenon. The relationship between the low-field mean free path ¿0 and the driving current in nano-MOSFETs is discussed. The results indicate it is the ¿0 instead of apparent mobility that determine the transport characteristics in nano-devices.
         
        
            Keywords : 
MOSFET; S-matrix theory; carrier mobility; semiconductor device models; drift-diffusion; inherent mobility reduction; low-field mean free path; nanoscale MOSFET; quasiballistic region; scattering matrix; transport property; unified mobility model; Analytical models; Backscatter; Current measurement; Data mining; Degradation; MOSFETs; Microelectronics; Nanoscale devices; Particle scattering; Quantum mechanics;
         
        
        
        
            Conference_Titel : 
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
         
        
            Conference_Location : 
Beijing
         
        
            Print_ISBN : 
978-1-4244-2185-5
         
        
            Electronic_ISBN : 
978-1-4244-2186-2
         
        
        
            DOI : 
10.1109/ICSICT.2008.4734549