DocumentCode :
2144551
Title :
Analysis of carbon-based interconnect breakdown
Author :
Kitsuki, Hirohiko ; Saito, Tsutomu ; Yamada, Toshishige ; Fabris, Drazen ; Wilhite, Patrick ; Suzuki, Makoto ; Yang, Cary Y.
Author_Institution :
Center for Nanostructures, Santa Clara University, California 95053-0569, USA
fYear :
2008
fDate :
20-23 Oct. 2008
Firstpage :
530
Lastpage :
533
Abstract :
Current-induced breakdown phenomena of carbon nanofibers (CNFs) for future on-chip interconnect applications are presented. The effect of heat dissipation via the underlying substrate is studied using different experimental configurations. Scanning electron microscopy (SEM) techniques are utilized to study the structural damage by current stress. While the measured maximum current density in the suspended CNF in air is inversely proportional to nanofiber length and independent of diameter, SiO2-supported CNFs improves their current capacity, which implies effective heat dissipation to the oxide. The correlation between maximum current density and electrical resistivity confirms the importance of local Joule heating, showing strong coupling between electrical and thermal transport in CNFs.
Keywords :
Couplings; Current density; Current measurement; Density measurement; Electric breakdown; Electric resistance; Length measurement; Resistance heating; Scanning electron microscopy; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location :
Beijing, China
Print_ISBN :
978-1-4244-2185-5
Electronic_ISBN :
978-1-4244-2186-2
Type :
conf
DOI :
10.1109/ICSICT.2008.4734589
Filename :
4734589
Link To Document :
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