DocumentCode :
2144728
Title :
Analysis of current-voltage characteristics in polysilicon TFTs for LCDs
Author :
Ono, K. ; Yoshimura, M. ; Mimura, A. ; Konishi, N. ; Miyata, K. ; Kawakami, H.
Author_Institution :
Hitachi Ltd., Ibaraki, Japan
fYear :
1988
fDate :
11-14 Dec. 1988
Firstpage :
256
Lastpage :
259
Abstract :
An analytic model which can accurately calculate the characteristics of polysilicon TFTs was developed. The theoretical current-voltage curves were compared with measured data, and correlations with trap density in polysilicon film and device performance were investigated. Good agreement was obtained between theoretical and measured results. It was also found that on-current was improved by reducing the densities near the band edges in a forbidden gap. This effect was realized by optimizing the film deposition temperature or by using laser annealing. A hydrogenation effect reduced the density near the midgap, which improved off-current. The TFTs were successfully applied in grey-scale liquid-crystal displays (LCDs) with fully integrated drive circuits.<>
Keywords :
elemental semiconductors; liquid crystal displays; semiconductor device models; silicon; thin film transistors; LCDs; analytic model; characteristics; current-voltage characteristics; current-voltage curves; device performance; film deposition temperature; fully integrated drive circuits; grey-scale liquid-crystal displays; hydrogenation effect; laser annealing; on-current; polycrystalline Si; semiconductors; trap density; Active matrix liquid crystal displays; Circuits; Current measurement; Current-voltage characteristics; Liquid crystal displays; Photonic band gap; Poisson equations; Temperature; Thin film transistors; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1988. IEDM '88. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.1988.32805
Filename :
32805
Link To Document :
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