• DocumentCode
    2145387
  • Title

    Failure mechanisms of interconnections in drop impact

  • Author

    Seah, S.K.W. ; Wong, E.H. ; Mai, Y.W. ; Rajoo, Ranjan ; Lim, Chun Teck

  • Author_Institution
    Inst. of Microelectron., Singapore
  • fYear
    0
  • fDate
    0-0 0
  • Abstract
    This study performs experimental tracking of crack propagation (stage II fatigue) in a single solder interconnection during drop impact. A high resolution, highspeed four-point resistance measurement system is used for tracking crack progression. Results indicate that most of the drop impact low-cycle fatigue life of the solder joint is spent in the crack initiation stage. Cross-sections and fractographs show that various mixes of intermetallic and bulk failure are possible within a single joint. Several failure mechanisms are suggested. Comparisons of failure modes are also made between drop impact, quasi-static loading and high-cycle fatigue. A thorough understanding of failure mechanisms is important for the development of failure criteria and life prediction models for drop impact
  • Keywords
    crack detection; failure analysis; fatigue cracks; fracture mechanics; impact testing; interconnections; life testing; soldering; solders; bulk failure; crack initiation stage; crack progression tracking; crack propagation; drop impact; fatigue life; four-point resistance measurement system; interconnection failure mechanisms; intermetallic failure; single solder interconnection; Assembly; Environmentally friendly manufacturing techniques; Failure analysis; Fatigue; Integrated circuit interconnections; Intermetallic; Lead; Packaging; Soldering; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference, 2006. Proceedings. 56th
  • Conference_Location
    San Diego, CA
  • ISSN
    0569-5503
  • Print_ISBN
    1-4244-0152-6
  • Type

    conf

  • DOI
    10.1109/ECTC.2006.1645852
  • Filename
    1645852