• DocumentCode
    2145555
  • Title

    Processing and performance of broadband integrated resistor structures on non-planar topologies in hermetic silicon enclosure with vertical micro vias

  • Author

    Greisen, Christoffer Graae ; Hauffe, Ralf ; Shiv, Lior ; Weichel, Steen ; Korth, Hilmar ; Kilian, Arnd ; Heschel, Matthias ; Kuhmann, Jochen

  • Author_Institution
    Hymite A/S, Lyngby
  • fYear
    0
  • fDate
    0-0 0
  • Abstract
    We present the integration of thin film nickel-chromium (NiCr) resistors into a hermetic, 3D structured silicon packaging platform for wafer level sealing and demonstrate their performance as broadband passive components. Resistors on the cavity side walls can be designed by modeling the material deposition as a unidirectional flux
  • Keywords
    chromium alloys; electrodeposition; network topology; nickel alloys; passive networks; thin film resistors; NiCr; broadband integrated resistor; broadband passive components; silicon packaging; thin film resistors; vertical micro vias; wafer level sealing; Conducting materials; Etching; Gold; Metallization; Packaging; Resistors; Semiconductor thin films; Silicon; Substrates; Topology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference, 2006. Proceedings. 56th
  • Conference_Location
    San Diego, CA
  • ISSN
    0569-5503
  • Print_ISBN
    1-4244-0152-6
  • Type

    conf

  • DOI
    10.1109/ECTC.2006.1645860
  • Filename
    1645860