DocumentCode
2145865
Title
Physics of Future Ultra High Speed Transistors - Part II: New Concepts
Author
Kasper, E. ; Reitemann, G.
Author_Institution
Institut fÿr Halbleitertechnik, Universit¿t Stuttgart, Pfaffenwaldring 47, D-70569 Stuttgart, Germany. E-mail: Post@iht.uni-stuttgart.de
Volume
1
fYear
1999
fDate
Oct. 1999
Firstpage
155
Lastpage
157
Abstract
SiGe/Si - MODFETs have obtained encouraging results with maximum oscillation frequencies for p-and n-channel devices around 100 GHz. The SiGe/Si system is the only one with nearly symmetrical transport properties of holes and electrons. Future development of silicon based ultra high frequency devices will be strongly influenced by integration demands, quality of MOS gates on heterostructures, strained layer engineering and band ordering. Devices which exploit tunnelling, coherent transport and transit time effects will gain importance. Room temperature tunnelling via SiGe quantum wells and quantum dots is proposed and partly tested. Resonance phase operation may allow oscillators with defimed frequencies above the conventional frequency limits.
Keywords
Charge carrier processes; Frequency; Germanium silicon alloys; HEMTs; MODFETs; Physics; Quantum dots; Silicon germanium; Temperature; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference, 1999. 29th European
Conference_Location
Munich, Germany
Type
conf
DOI
10.1109/EUMA.1999.338296
Filename
4139391
Link To Document