• DocumentCode
    2145865
  • Title

    Physics of Future Ultra High Speed Transistors - Part II: New Concepts

  • Author

    Kasper, E. ; Reitemann, G.

  • Author_Institution
    Institut fÿr Halbleitertechnik, Universit¿t Stuttgart, Pfaffenwaldring 47, D-70569 Stuttgart, Germany. E-mail: Post@iht.uni-stuttgart.de
  • Volume
    1
  • fYear
    1999
  • fDate
    Oct. 1999
  • Firstpage
    155
  • Lastpage
    157
  • Abstract
    SiGe/Si - MODFETs have obtained encouraging results with maximum oscillation frequencies for p-and n-channel devices around 100 GHz. The SiGe/Si system is the only one with nearly symmetrical transport properties of holes and electrons. Future development of silicon based ultra high frequency devices will be strongly influenced by integration demands, quality of MOS gates on heterostructures, strained layer engineering and band ordering. Devices which exploit tunnelling, coherent transport and transit time effects will gain importance. Room temperature tunnelling via SiGe quantum wells and quantum dots is proposed and partly tested. Resonance phase operation may allow oscillators with defimed frequencies above the conventional frequency limits.
  • Keywords
    Charge carrier processes; Frequency; Germanium silicon alloys; HEMTs; MODFETs; Physics; Quantum dots; Silicon germanium; Temperature; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference, 1999. 29th European
  • Conference_Location
    Munich, Germany
  • Type

    conf

  • DOI
    10.1109/EUMA.1999.338296
  • Filename
    4139391