• DocumentCode
    2145907
  • Title

    Evolution of wetting layers in InAs/GaAs quantum-dot system studied by reflectance difference spectroscopy

  • Author

    Chen, Yonghai ; Tang, Chenguang ; Xu, Bo ; Jin, Peng ; Wang, Zhanguo

  • Author_Institution
    Key Lab. of Semicond. Mater. Sci., Chinese Acad. of Sci., Beijing, China
  • fYear
    2008
  • fDate
    20-23 Oct. 2008
  • Firstpage
    673
  • Lastpage
    676
  • Abstract
    The wetting layers (WL) in InAs/GaAs quantum-dot system have been studied by reflectance difference spectroscopy (RDS), in which two structures related to the heavy-hole (HH) and light-hole (LH) transitions in the WL have been observed. The evolution and segregation behaviors of WL during Stranski-Krastanow (SK) growth mode have been studied from the analysis of the WL-related optical transition energies. It has been found that the segregation coefficient of Indium atoms varies linearly with the InAs amount in WL. In addition, the effect of the growth temperature on the critical thickness for InAs island formation has also been studied. The critical thickness defined by the appearance of InAs dots, which is determined by AFM, shows a complex variation with the growth temperature. However, the critical thickness determined by RDS is almost constant in the range of 510-540°C.
  • Keywords
    III-V semiconductors; atomic force microscopy; gallium arsenide; indium compounds; semiconductor growth; semiconductor quantum dots; wetting; AFM; InAs-GaAs; Stranski-Krastanow growth mode; complex variation; growth temperature; heavy hole; island formation; light hole transitions; optical transition energies; quantum dot system; reflectance difference spectroscopy; segregation coefficient; temperature 510 degC to 540 degC; wetting layers; Atom optics; Atomic force microscopy; Gallium arsenide; Indium; Optical sensors; Quantum dots; Reflectivity; Spectroscopy; Temperature; Transmission electron microscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-2185-5
  • Electronic_ISBN
    978-1-4244-2186-2
  • Type

    conf

  • DOI
    10.1109/ICSICT.2008.4734643
  • Filename
    4734643