DocumentCode
2145907
Title
Evolution of wetting layers in InAs/GaAs quantum-dot system studied by reflectance difference spectroscopy
Author
Chen, Yonghai ; Tang, Chenguang ; Xu, Bo ; Jin, Peng ; Wang, Zhanguo
Author_Institution
Key Lab. of Semicond. Mater. Sci., Chinese Acad. of Sci., Beijing, China
fYear
2008
fDate
20-23 Oct. 2008
Firstpage
673
Lastpage
676
Abstract
The wetting layers (WL) in InAs/GaAs quantum-dot system have been studied by reflectance difference spectroscopy (RDS), in which two structures related to the heavy-hole (HH) and light-hole (LH) transitions in the WL have been observed. The evolution and segregation behaviors of WL during Stranski-Krastanow (SK) growth mode have been studied from the analysis of the WL-related optical transition energies. It has been found that the segregation coefficient of Indium atoms varies linearly with the InAs amount in WL. In addition, the effect of the growth temperature on the critical thickness for InAs island formation has also been studied. The critical thickness defined by the appearance of InAs dots, which is determined by AFM, shows a complex variation with the growth temperature. However, the critical thickness determined by RDS is almost constant in the range of 510-540°C.
Keywords
III-V semiconductors; atomic force microscopy; gallium arsenide; indium compounds; semiconductor growth; semiconductor quantum dots; wetting; AFM; InAs-GaAs; Stranski-Krastanow growth mode; complex variation; growth temperature; heavy hole; island formation; light hole transitions; optical transition energies; quantum dot system; reflectance difference spectroscopy; segregation coefficient; temperature 510 degC to 540 degC; wetting layers; Atom optics; Atomic force microscopy; Gallium arsenide; Indium; Optical sensors; Quantum dots; Reflectivity; Spectroscopy; Temperature; Transmission electron microscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location
Beijing
Print_ISBN
978-1-4244-2185-5
Electronic_ISBN
978-1-4244-2186-2
Type
conf
DOI
10.1109/ICSICT.2008.4734643
Filename
4734643
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