• DocumentCode
    2146191
  • Title

    Plasma stream homogeneity in metal plasma immersion ion implantation and deposition

  • Author

    Mändl, S. ; Rauschenbach, B.

  • Author_Institution
    Inst. fur Oberflachenmodifizierung, Leipzig, Germany
  • fYear
    2002
  • fDate
    2002
  • Firstpage
    455
  • Lastpage
    458
  • Abstract
    The homogeneity of metal plasma immersion ion implantation and deposition (MePIIID) was investigated for flat substrates and the materials systems Al, AlN, Ti, TiN, TiO2, and ZnO. An influence of pulse voltage, cathode material and backfill on the lateral homogeneity was observed, so that the plasma stream emanating from the arc as well as the plasma sheath evolving around the substrates contribute to the radial homogeneity in MePIIID.
  • Keywords
    metals; plasma deposition; plasma immersion ion implantation; Al; AlN; Ti; TiN; TiO2; ZnO; backfill; cathode material; flat substrates; metal plasma immersion ion implantation and deposition; plasma stream homogeneity; pulse voltage; Acceleration; Cathodes; Plasma accelerators; Plasma density; Plasma immersion ion implantation; Plasma materials processing; Plasma sheaths; Plasma sources; Voltage; Zinc oxide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Discharges and Electrical Insulation in Vacuum, 2002. 20th International Symposium on
  • Print_ISBN
    0-7803-7394-4
  • Type

    conf

  • DOI
    10.1109/ISDEIV.2002.1027407
  • Filename
    1027407
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2146191