• DocumentCode
    2146244
  • Title

    Asymmetric issues of FinFET device after hot carrier injection and impact on digital and analog circuits

  • Author

    Ma, Chenyue ; Wang, Hao ; Zhang, Xiufang ; He, Frank ; Yadong He ; Zhang, Xing ; Lin, Xinnan

  • Author_Institution
    Peking Univ., China
  • fYear
    2010
  • fDate
    22-24 March 2010
  • Firstpage
    432
  • Lastpage
    436
  • Abstract
    This paper presents the asymmetric issue of FinFET device after hot carrier injection (HCI) effect and impact on the digital and analog circuits. The interface state distribution along the FinFET channel is first extracted from hot carrier injection experimental data, and then develops a compact FinFET model to simulate the impact on asymmetric distribution of interface states to the device characteristics. The results show that the asymmetric degradation is much more significant in Ids-Vds characteristics than in Ids-Vgs characteristics. On the other hand, digital and analogy circuits exhibit different asymmetric performance degradation in various operation cases.
  • Keywords
    MOSFET; analogue integrated circuits; digital integrated circuits; hot carriers; FinFET channel; FinFET device; HCI effect; analog circuits; digital circuits; hot carrier injection; interface state distribution; interface states asymmetric distribution; Analog circuits; Circuit simulation; Data mining; Degradation; FinFETs; Hot carrier injection; Human computer interaction; Interface states; Stress; Voltage; FinFET; asymmetric issues; circuit simulation; compact model; hot carrier injection;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quality Electronic Design (ISQED), 2010 11th International Symposium on
  • Conference_Location
    San Jose, CA
  • ISSN
    1948-3287
  • Print_ISBN
    978-1-4244-6454-8
  • Type

    conf

  • DOI
    10.1109/ISQED.2010.5450542
  • Filename
    5450542