DocumentCode :
2146505
Title :
High efficiency silicon visible light emitter using silicon nanocrystals in silicon nitride matrix and transparent doping layer
Author :
Sung, Gun Yong ; Park, Nae-Man ; Kim, Tae-Youb ; Kim, Kyung-Hyun ; Cho, Kwan Sik ; Shin, Jae Heon
Author_Institution :
Future Technol. Res. Div., ETRI, Daejeon, South Korea
fYear :
2005
fDate :
21-23 Sept. 2005
Firstpage :
51
Lastpage :
53
Abstract :
Semiconductor electronics is strongly dominated by silicon technology. However silicon technology does not allow easy integration with optical component since silicon is a poor light emitter. The unique properties of Si nanocrystals (nc-Si) can be exploited to fabricate Si-based light source. We will introduce a quantum confinement effect in the nc-Si embedded in a silicon nitride formed by PECVD. The band gap of the nc-Si could be controlled from 1.38 to 3.02 eV by decreasing the nanocrystal size. In addition, we will demonstrate a silicon light emitter with a transparent doping layer on nc-Si embedded in silicon nitride active layer by using ITO and n-type wide bandgap semiconducting layer. This light emitter has high external quantum efficiency of 1.6%, which is the highest value ever reported in Si-based visible light emitters.
Keywords :
elemental semiconductors; energy gap; indium compounds; integrated optics; integrated optoelectronics; light emitting devices; light sources; nanostructured materials; semiconductor doping; silicon; silicon compounds; transparency; wide band gap semiconductors; 1.38 to 3.02 eV; ITO; ITO layer; InSnO; PECVD; Si; Si-based light source; SiN; band gap; external quantum efficiency; high efficiency light emitter; n-type wide bandgap semiconducting layer; nanocrystal size; quantum confinement effect; semiconductor electronics; silicon light emitter; silicon nanocrystals; silicon nitride matrix; silicon technology; transparent doping layer; visible light emitter; Indium tin oxide; Light emitting diodes; Light sources; Nanocrystals; Optical devices; Photonic band gap; Potential well; Semiconductor device doping; Silicon; Size control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics, 2005. 2nd IEEE International Conference on
Print_ISBN :
0-7803-9070-9
Type :
conf
DOI :
10.1109/GROUP4.2005.1516400
Filename :
1516400
Link To Document :
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