DocumentCode :
2146765
Title :
A novel circuit scheme and analysis for three-level feram
Author :
Wu, Hao ; Jia, Ze ; Ren, Tian-Ling
Author_Institution :
Tsinghua Nat. Lab. for Inf. Sci. & Technol., Tsinghua Univ., Beijing, China
fYear :
2008
fDate :
20-23 Oct. 2008
Firstpage :
880
Lastpage :
883
Abstract :
This paper proposes a novel circuit architecture and its operation style for three-level ferroelectric random access memory (FeRAM) which can improve storage density by 1.5 times compared to traditional ITIC FeRAM under same technology. A new reference voltage generation scheme is adopted to enhance the reliability of this proposed circuit architecture. Based on the results of simulation, the function and reliability of three-level FeRAM have been analyzed and verified.
Keywords :
ferroelectric storage; integrated circuit reliability; random-access storage; FeRAM reliability; circuit analysis; circuit architecture; circuit scheme; ferroelectric random access memory; reference voltage generation scheme; storage density; three-level FeRAM; Capacitors; Circuit analysis; Encoding; Ferroelectric films; Ferroelectric materials; Information analysis; Nonvolatile memory; Polarization; Random access memory; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-2185-5
Electronic_ISBN :
978-1-4244-2186-2
Type :
conf
DOI :
10.1109/ICSICT.2008.4734684
Filename :
4734684
Link To Document :
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