DocumentCode :
2146925
Title :
Ionic memory - materials and device characteristics
Author :
Kozicki, Michael N.
Author_Institution :
Center for Appl. Nanoionics, Arizona State Univ., Tempe, AZ, USA
fYear :
2008
fDate :
20-23 Oct. 2008
Firstpage :
897
Lastpage :
900
Abstract :
Scalable elements that can be switched between widely-separated non-volatile resistance states at very low power are desirable for applications in next generation memory and logic. One promising approach involves the use of solid ion-conducting films. A mobile metal ion-containing glassy electrolyte film sandwiched between an oxidizable metal layer and an inert electrode constitutes a device which reversibly transitions between high and low resistance states. The resistance reduction occurs by the formation of a nanoscale conducting pathway created by reduction of the metal ions. A reverse bias dissolves the connection. In addition to possessing the speed, endurance, retention, and CMOS compatibility required of future switching elements, such devices have excellent scaling prospects due to their low operational energy and demonstrated physical scalability. This paper discusses the materials and mechanisms of ionic memory and presents the electrical characteristics of devices formed from Ag-Ge-S and Cu-Si-O electrolytes as examples of the technology.
Keywords :
ionic conductivity; ions; memory architecture; random-access storage; semiconductor technology; Ag-Ge-S; Cu-Si-O; device characteristics; inert electrode; ion-conducting films; ionic memory; logic; metal ions; mobile metal ion-containing glassy electrolyte film; nonvolatile resistance states; resistance reduction; scalable elements; switching elements; Electric variables; Electrodes; Inorganic materials; Logic devices; Nanoporous materials; Nanoscale devices; Nonvolatile memory; Potential well; Scalability; Solids;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-2185-5
Electronic_ISBN :
978-1-4244-2186-2
Type :
conf
DOI :
10.1109/ICSICT.2008.4734690
Filename :
4734690
Link To Document :
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