DocumentCode :
2146928
Title :
Cavity-Q measurements of silica microsphere with nanocrystal Si active layer
Author :
Sung, Joo-Yeon ; Shin, Jung H. ; Tewari, Anuranjita ; Brongersma, Mark
Author_Institution :
Dept. of Phys., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
fYear :
2005
fDate :
21-23 Sept. 2005
Firstpage :
102
Lastpage :
104
Abstract :
Cavity Q of silica microsphere with nanocrystal silicon active layer is investigated. Q factor of up to 8×105 is observed, and loss due to nc-Si is identified as not dominating the loss mechanism.
Keywords :
Q-factor; elemental semiconductors; integrated optics; micro-optics; microcavities; nanostructured materials; optical losses; silicon; silicon compounds; Q factor; Si; Si active layer; SiO2; cavity-Q measurements; loss mechanism; nanocrystal Si; silica microsphere; Annealing; Fiber nonlinear optics; Nanocrystals; Nonlinear optics; Optical losses; Optical materials; Optical scattering; Optical sensors; Silicon compounds; Stimulated emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics, 2005. 2nd IEEE International Conference on
Print_ISBN :
0-7803-9070-9
Type :
conf
DOI :
10.1109/GROUP4.2005.1516418
Filename :
1516418
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2146928
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