DocumentCode
2147051
Title
Trimming of silicon nitride microring resonators with a polysilane top cladding
Author
Sparacin, Daniel K. ; Lock, John P. ; Hong, Ching-Yin ; Gleason, K.K. ; Kimerling, L.C. ; Michel, Jurgen
Author_Institution
MIT, Cambridge, MA, USA
fYear
2005
fDate
21-23 Sept. 2005
Firstpage
117
Lastpage
119
Abstract
We demonstrate 23.5 nm shifts of Si3N4 microring resonances by exposing a polysilane cladding layer to UV light. Our PECVD polysilane cladding is superior to other approaches, because it is insoluble, demonstrates good stability, and exhibits ∼4% index shift.
Keywords
claddings; micro-optics; optical polymers; optical resonators; plasma CVD; silicon compounds; PECVD; Si3N4; index shift; polysilane top cladding; silicon nitride microring resonators; Circuits; Laser modes; Optical filters; Optical resonators; Optical ring resonators; Refractive index; Resonance; Ring lasers; Silicon; Ultrafast optics;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics, 2005. 2nd IEEE International Conference on
Print_ISBN
0-7803-9070-9
Type
conf
DOI
10.1109/GROUP4.2005.1516423
Filename
1516423
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