Title :
Tunable Y laser with reactive ion etched mirror facets suitable for integration
Author :
Schilling, M. ; Daub, K. ; Lach, E. ; Laube, G.
Author_Institution :
Optoelectron. Components Div., Alcatel SEL, Stuttgart, Germany
Abstract :
The tunable Y laser is realised for the first time in an integratable form featuring dry etched facets. Reactive ion etching with a CH4/H2/CO2 gas mixture is successfully applied for the mirror formation. First devices with asymmetrically dry etched branches exhibit a low cw threshold current of 4×18 mA and a wide tuning range of 15.6 nm using “single knob” tuning by only one tuning current
Keywords :
integrated optics; laser tuning; mirrors; optical workshop techniques; semiconductor lasers; sputter etching; CH4/H2/CO2 gas mixture; MQW lasers; asymmetrically dry etched branches; cw threshold current; dry etched facets; integratable form; mirror formation; reactive ion etched mirror facets; single knob tuning; tunable Y laser; tuning current; tuning range; Dry etching; Gas lasers; Laser tuning; Mirrors; Optical interferometry; Optical tuning; Quantum well devices; Space technology; Threshold current; Tunable circuits and devices;
Conference_Titel :
Indium Phosphide and Related Materials, 1994. Conference Proceedings., Sixth International Conference on
Conference_Location :
Santa Barbara, CA
Print_ISBN :
0-7803-1476-X
DOI :
10.1109/ICIPRM.1994.328154
