DocumentCode :
2147114
Title :
Resistive switching behaviors and mechanism of transition metal oxides-based memory devices
Author :
Kang, J.F. ; Sun, B. ; Gao, B. ; Xu, N. ; Sun, X. ; Liu, L.F. ; Wang, Y. ; Liu, X.Y. ; Han, R.Q. ; Wang, Y.Y.
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
fYear :
2008
fDate :
20-23 Oct. 2008
Firstpage :
921
Lastpage :
924
Abstract :
In this paper, the characteristics and mechanism of the transition metal oxide (TMO) based resistive switching memory (RRAM) devices were addressed. The results show that doping in oxide matrix materials, electrode material, and operating mode of the set/reset process may significantly affect the resistive switching behaviors of RRAM devices. Optimizing the dopants and matrix materials, electrode materials, device structure, and operating modes and understanding the related mechanisms are required to achieve the excellent device performance of TMO-based RRAM for the memory application. A unified physical model, based on the electron hopping transport between oxygen vacancies along the conductive filament paths, is used to explain and describe the resistive switching behaviors of the TMO based RRAM devices.
Keywords :
MIM structures; cerium compounds; doping; electrodes; hopping conduction; optimisation; random-access storage; titanium compounds; vacancies (crystal); zinc compounds; zirconium compounds; CeOx; MIM structure; RRAM devices; TiOx; ZnO; ZrOx; device structure; doping; electrode material; electron hopping transport; operating modes; optimization; oxide matrix materials; oxygen vacancies; resistive switching memory; transition metal oxide; Conducting materials; Doping; Electrodes; Laboratories; Microelectronics; Sun; Temperature; Tin; Voltage; Zinc oxide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-2185-5
Electronic_ISBN :
978-1-4244-2186-2
Type :
conf
DOI :
10.1109/ICSICT.2008.4734696
Filename :
4734696
Link To Document :
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