• DocumentCode
    2147402
  • Title

    Optimization of charge pumping technique in polysilicon TFTs for geometric effect elimination and trap state density extraction

  • Author

    Lu, Lei ; Wang, Mingxiang ; Wong, Man

  • Author_Institution
    Dept. of Microelectron., Soochow Univ., Suzhou, China
  • fYear
    2008
  • fDate
    20-23 Oct. 2008
  • Firstpage
    978
  • Lastpage
    981
  • Abstract
    Charge pumping (CP) technique is optimized to minimize the geometric component in the CP current in polysilicon TFTs, by taking into account the pulse waveform and its transition times. Based on the optimization, ideal CP curves similar to those in MOSFETs are obtained. Important information on the trap state density of polysilicon TFTs, i.e., the mean value as well as the energy distribution within the band-gap, can be reliably extracted in different ways.
  • Keywords
    optimisation; silicon; thin film transistors; CP current; band-gap; charge pumping technique; energy distribution; geometric effect elimination; optimization; polysilicon TFT; pulse waveform transition time; trap state density extraction; Charge pumps; Crystallization; Data mining; Electron traps; MOSFETs; Microelectronics; Photonic band gap; Pulse measurements; Spontaneous emission; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-2185-5
  • Electronic_ISBN
    978-1-4244-2186-2
  • Type

    conf

  • DOI
    10.1109/ICSICT.2008.4734707
  • Filename
    4734707