DocumentCode
2147402
Title
Optimization of charge pumping technique in polysilicon TFTs for geometric effect elimination and trap state density extraction
Author
Lu, Lei ; Wang, Mingxiang ; Wong, Man
Author_Institution
Dept. of Microelectron., Soochow Univ., Suzhou, China
fYear
2008
fDate
20-23 Oct. 2008
Firstpage
978
Lastpage
981
Abstract
Charge pumping (CP) technique is optimized to minimize the geometric component in the CP current in polysilicon TFTs, by taking into account the pulse waveform and its transition times. Based on the optimization, ideal CP curves similar to those in MOSFETs are obtained. Important information on the trap state density of polysilicon TFTs, i.e., the mean value as well as the energy distribution within the band-gap, can be reliably extracted in different ways.
Keywords
optimisation; silicon; thin film transistors; CP current; band-gap; charge pumping technique; energy distribution; geometric effect elimination; optimization; polysilicon TFT; pulse waveform transition time; trap state density extraction; Charge pumps; Crystallization; Data mining; Electron traps; MOSFETs; Microelectronics; Photonic band gap; Pulse measurements; Spontaneous emission; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location
Beijing
Print_ISBN
978-1-4244-2185-5
Electronic_ISBN
978-1-4244-2186-2
Type
conf
DOI
10.1109/ICSICT.2008.4734707
Filename
4734707
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