Title :
Monolithic integration of light emitting diodes, photodetector and receiver circuit in standard CMOS technology
Author :
Huang, Beiju ; XuZhang ; ZanDong ; WeiWang ; Chen, HongDa
Author_Institution :
State Key Lab. on Integrated Optoelectron., Chinese Acad. of Sci., Beijing, China
Abstract :
A monolithic silicon CMOS optoelectronic integrated circuit (OEIC) is designed and fabricated with standard 0.35 ¿m CMOS technology. This OEIC circuit consists of light emitting diodes (LED), silicon dioxide waveguide, photodiodes and receiver circuit. The silicon LED operates in reverse breakdown mode and can be turned on at 8.5 V 10 mA. The silicon dioxide waveguide is composed of multiple layers of silicon dioxide between different metals layers. A two PN-junctions photodetector composed of n-well/p-substrate junction and p+ active implantation/n-well junction maximizes the depletion region width. The readout circuitry in pixels is exploited to handle as small as 0.1 nA photocurrent. Simulation and testing results show that the optical emissions powers are about two orders higher than the low frequency detectivity of silicon CMOS photodetector and receiver circuit.
Keywords :
CMOS integrated circuits; integrated optoelectronics; light emitting diodes; monolithic integrated circuits; optical receivers; photodetectors; CMOS technology; PN-junctions; Si; SiO2; current 0.1 nA; current 10 mA; light emitting diodes; low frequency detectivity; monolithic integration; monolithic silicon CMOS; n-well-p-substrate junction; optical emissions; optoelectronic integrated circuit; p+ active implantation; photocurrent; photodetector; photodiodes; readout circuitry; receiver circuit; reverse breakdown mode; silicon LED; silicon dioxide waveguide; size 0.35 mum; standard CMOS technology; voltage 8.5 V; CMOS technology; Circuit testing; Integrated circuit technology; Light emitting diodes; Monolithic integrated circuits; Optical receivers; Optical waveguides; Optoelectronic devices; Photodetectors; Silicon compounds;
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-2185-5
Electronic_ISBN :
978-1-4244-2186-2
DOI :
10.1109/ICSICT.2008.4734709