DocumentCode :
2147923
Title :
III-N based electronics
Author :
Shur, Michael S. ; Simin, Grigory ; Gaska, Remis
Author_Institution :
Center for Integrated Electron., Rensselaer Polytech. Inst., Troy, NY, USA
fYear :
2008
fDate :
20-23 Oct. 2008
Firstpage :
1066
Lastpage :
1069
Abstract :
Large current carrying capabilities of AlN/GaN/InN based heterostructures and high breakdown voltages make this materials system uniquely suited for applications in high power and/or high frequency electronic devices, including power amplifiers, broadband amplifiers, power switches, and radio frequency switches. AlGaN/GaN insulated gate transistors have additional advantages of extremely low leakage current, higher current swing, improved linearity, better reliability, and higher power. The use of high-K dielectrics in such structures is expected to further improve performance. Reliability issues that have slowed down commercialization of III-N electronics are now being resolved based on better understanding of device physics and device failure mechanisms.
Keywords :
III-V semiconductors; gallium compounds; indium compounds; leakage currents; power amplifiers; semiconductor devices; semiconductor industry; wideband amplifiers; AlGaN-GaN; AlN-GaN-InN; III-N based electronics; broadband amplifiers; electronic devices; heterostructures; high breakdown voltages; high-k dielectrics; insulated gate transistors; leakage current; power amplifiers; power switches; radio frequency switches; Aluminum gallium nitride; Broadband amplifiers; Dielectrics and electrical insulation; Gallium nitride; High power amplifiers; Leakage current; Linearity; Radio frequency; Radiofrequency amplifiers; Switches;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-2185-5
Electronic_ISBN :
978-1-4244-2186-2
Type :
conf
DOI :
10.1109/ICSICT.2008.4734729
Filename :
4734729
Link To Document :
بازگشت