Title :
Single wafer all-wet photo resist strip process for LDD implant in CMOS technology
Author :
Bonfanti, Paolo ; Sellmer, Reinhard ; Liu, Glen ; He, Youfeng ; Hao, Liu ; Henry, Sally-Ann ; Deutschmann, Lutz ; Archer, Leo
Author_Institution :
SMIC, Beijing, China
Abstract :
This paper reports the comparison between conventional ash followed by wet bench process approach and the new all wet process for LDD implant application. The comparison covers the areas of defect performance, (material loss, electrical data, yield) and chemical consumption.
Keywords :
CMOS integrated circuits; photoresists; CMOS technology; LDD implant; single wafer all-wet photo resist strip process; CMOS process; CMOS technology; Chemicals; Cleaning; Implants; Performance loss; Resists; Strips; Substrates; Thickness control;
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-2185-5
Electronic_ISBN :
978-1-4244-2186-2
DOI :
10.1109/ICSICT.2008.4734748
