Title :
Simulated profiles from the layout-design interface in X (SIMPL-DIX)
Author :
Wu, H.C. ; Wong, A.S. ; Koh, Y.L. ; Scheckler, E.W. ; Neureuther, A.R.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
Abstract :
SIMPL-DIX is an X-window-based interactive computer-aided-design tool for running process and device simulators from layout and process specifications. Using an interactive menu, scanning-electron-microscope-like cross-sections along a cut line on the layout can be generated and investigated. with internal analysis tools, the system provides design interfaces for highlighting locations where topography problems are anticipated (HUNCH), for identifying the effects of misalignment (WORST), and for critiquing the resulting topography profiles (CRITIC). As a process simulation manager, SIMPL-DIX allows processes to be simulated either rapidly with elementary models in SIMPL-2 or rigorously through calls to external process simulators such as SAMPLE and CREEP. SIMPL-DIX is also a convenient interface for generating input files for PISCES II and SUPREM III.<>
Keywords :
CAD; electronic engineering computing; integrated circuit technology; semiconductor device models; CREEP; CRITIC; HUNCH; PISCES II; SAMPLE; SIMPL-DIX; SUPREM III; WORST; X-window-based interactive computer-aided-design tool; device simulators; external process simulators; interactive menu; internal analysis tools; layout-design interface; misalignment; process simulation manager; scanning-electron-microscope-like cross-sections; topography problems; topography profiles; Circuit simulation; Computational modeling; Computer simulation; Creep; Displays; Graphics; Laboratories; Layout; Mice; Surfaces;
Conference_Titel :
Electron Devices Meeting, 1988. IEDM '88. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
DOI :
10.1109/IEDM.1988.32823
