DocumentCode
2149004
Title
Band discontinuity reduction of i-GaInAsP/p-InP for improving 1.55 μm GaInAsP/InP surface emitting laser performances
Author
Mori, K. ; Miyamoto, T. ; Yokouchi, N. ; Inaba, Y. ; Koyama, F. ; Iga, K.
Author_Institution
Precision & Intelligence Lab., Tokyo Inst. of Technol., Yokohama, Japan
fYear
1994
fDate
27-31 Mar 1994
Firstpage
311
Lastpage
314
Abstract
The long wavelength GaInAsP/InP surface emitting (SE) laser is becoming important for use in optical fiber networks. We reported a low threshold GaInAsP/InP SE laser grown by chemical beam epitaxy (CBE) with some device characteristics. However, its temperature dependence on threshold and efficiency are inferior to those of short wavelength SE lasers. The auger process and intervalence band absorption were discussed as the primary causes of the worse temperature characteristic. In addition to these, the potential spike at the active layer and p-cladding hetero-interface may require an additional voltage bias to inject holes. Takemoto et al. proposed a band discontinuity reduction (BDR) layer to reduce the spike height. Kazarinov et al. Pointed out that this spike reduces a potential barrier for electron confinement in the active layer and increases an electron overflow to the p-cladding layer. A preliminary calculation shows the carrier overflow may degrade the performance of long wavelength SE lasers. In this study, we investigate the current-voltage characteristic of the hetero-interface and introduce a BDR layer which has an intermediate composition between the active layer and the p-cladding layer in order to improve the temperature characteristic of long wavelength SE lasers
Keywords
Auger effect; III-V semiconductors; band structure of crystalline semiconductors and insulators; gallium arsenide; indium compounds; optical communication equipment; semiconductor lasers; 1.55 μm GaInAsP/InP surface emitting laser performance; 1.55 mum; GaInAsP-InP; active layer; additional voltage bias; auger process; band discontinuity reduction; chemical beam epitaxy; current-voltage characteristic; device characteristics; electron confinement; electron overflow; hetero-interface; i-GaInAsP/p-InP; inject holes; intervalence band absorption; low threshold; optical fiber networks; p-cladding layer; spike height; temperature dependence; worse temperature characteristic; Chemical lasers; Electrons; Fiber lasers; Indium phosphide; Laser beams; Optical fiber networks; Optical surface waves; Surface emitting lasers; Surface waves; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 1994. Conference Proceedings., Sixth International Conference on
Conference_Location
Santa Barbara, CA
Print_ISBN
0-7803-1476-X
Type
conf
DOI
10.1109/ICIPRM.1994.328232
Filename
328232
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