DocumentCode :
2149276
Title :
Electrical characterization of ultrathin single crystalline Gd2O3/Si(100) with Pt top electrode
Author :
Sun, Qing-Qing ; Laha, Apurba ; Osten, H. Jörg ; Ding, Shi-Jin ; Zhang, David Wei ; Fissel, A.
Author_Institution :
Dept. of Microelectron., Fudan Univ., Shanghai, China
fYear :
2008
fDate :
20-23 Oct. 2008
Firstpage :
1276
Lastpage :
1279
Abstract :
Capacitor composed of single crystalline Gd2O3 on Si(100) with Pt top electrode was fabricated by molecular beam epitaxy. We present a systematic study of electrical properties of as-grown single crystalline Pt/Gd2O3/Si(100). Three capacitors with different thickness are used for electrical evaluation. The EOT of the samples are estimated to be 0.7 nm, 1.2 nm and 1.8 nm respectively. Work function of Pt on Gd2O3 is pinned at 4.75 eV and due to the lattice mismatch between Gd2O3, the interface state density is in the level of 1013 extracted by Terman and conductance methods.
Keywords :
capacitors; electrodes; elemental semiconductors; gadolinium compounds; molecular beams; platinum; silicon; Gd2O3; Terman extraction; conductance method; electrical characterization; lattice mismatch; molecular beam epitaxy; top electrode; ultrathin single crystalline capacitor; Amorphous materials; Capacitance-voltage characteristics; Crystallization; Dielectric constant; Electrodes; High K dielectric materials; High-K gate dielectrics; Laboratories; Molecular beam epitaxial growth; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-2185-5
Electronic_ISBN :
978-1-4244-2186-2
Type :
conf
DOI :
10.1109/ICSICT.2008.4734784
Filename :
4734784
Link To Document :
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