DocumentCode :
2149423
Title :
Potential and limitations of selective disordering processes in GaInAsP and AlGaInP heterostructures
Author :
Forchel, A. ; Oshinowo, J. ; Kerkel, K. ; Hamisch, Y. ; Steffen, R.
Author_Institution :
Technische Phys., Wurzburg Univ., Germany
fYear :
1994
fDate :
27-31 Mar 1994
Firstpage :
375
Lastpage :
378
Abstract :
The paper reviews different approaches to selective intermixing of GaInAs/InP- and GaInP/AlGaInP-quantum wells. These techniques are based on the fact that quantum wells involve extremely large concentration gradients at the heterointerfaces. These metastable structures give rise to strong interdiffusion effects in high temperature processes. Due to the diffusion of atoms from the quantum well barriers into the quantum well layers and the simultaneous diffusion of atoms out of the active layer the interdiffusion results generally in an increase of the band gap in the quantum well layers. By implantation damage or dopant diffusion the intermixing of the quantum wells may be enhanced locally. Therefore this technique can be used to define e.g. buried waveguides without the need of multiple epitaxy steps. We have investigated intermixing processes in GaInAs/InP- and GaInP/AlGaInP-quantum wells by using rapid thermal annealing. A selective intermixing was obtained by ion implantation in masked samples and by a local modulation of the thermal stability in suitably etched structures
Keywords :
III-V semiconductors; aluminium compounds; annealing; chemical interdiffusion; energy gap; gallium arsenide; gallium compounds; indium compounds; ion implantation; rapid thermal processing; semiconductor quantum wells; GaInAs-InP; GaInP-AlGaInP; band gap; buried waveguides; concentration gradients; dopant diffusion; implantation damage; interdiffusion effects; metastable structures; quantum wells; rapid thermal annealing; selective disordering processes; selective intermixing; thermal stability; Atomic layer deposition; Epitaxial growth; Etching; Ion implantation; Metastasis; Photonic band gap; Rapid thermal annealing; Rapid thermal processing; Temperature; Thermal stability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1994. Conference Proceedings., Sixth International Conference on
Conference_Location :
Santa Barbara, CA
Print_ISBN :
0-7803-1476-X
Type :
conf
DOI :
10.1109/ICIPRM.1994.328248
Filename :
328248
Link To Document :
بازگشت