DocumentCode :
2149571
Title :
Why are SCE overestimated in FD-SOI MOSFETs?
Author :
Navarro, C. ; Bawedin, M. ; Andrieu, F. ; Sagnes, B. ; Cristolovcanu, S.
Author_Institution :
Inst. d´Electron. du Sud, Univ. de Montpellier 2, Montpellier, France
fYear :
2013
fDate :
16-20 Sept. 2013
Firstpage :
304
Lastpage :
307
Abstract :
Experimental results show that the measurement and interpretation of short-channel effects (SCE) are misleading in advanced SOI MOSFETs. Part of SCE is due to the parasitic contribution of the back gate via channel coupling. We demonstrate that the contributions of each gate to the overall SCE can be discriminated. Numerical simulations indicate that their mutual relevance depends on the transistor architecture. A pragmatic biasing method is proposed for the reduction of charge sharing and DIBL effects. We present a simple model which is effective in decorrelating the genuine SCE at each gate and can be advantageously applied to device optimization.
Keywords :
MOSFET; numerical analysis; semiconductor device measurement; silicon-on-insulator; DIBL effects; FD-SOI MOSFET; channel coupling; charge sharing; device optimization; numerical simulation; pragmatic biasing method; short-channel effects; transistor architecture; Couplings; Electric potential; Films; Logic gates; MOSFET; Threshold voltage; Voltage measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference (ESSDERC), 2013 Proceedings of the European
Conference_Location :
Bucharest
Type :
conf
DOI :
10.1109/ESSDERC.2013.6818879
Filename :
6818879
Link To Document :
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