• DocumentCode
    2149651
  • Title

    Two 130nm CMOS class-D RF power amplifiers suitable for polar transmitter architectures

  • Author

    Cijvat, Ellie ; Sjöland, Henrik

  • Author_Institution
    Dept. of Electr. & Inf. Technol., Lund Univ., Lund, Sweden
  • fYear
    2008
  • fDate
    20-23 Oct. 2008
  • Firstpage
    1380
  • Lastpage
    1383
  • Abstract
    Two class-D RF power amplifiers consisting of CMOS inverter chains have been designed and measured. The first amplifier operates at 1 GHz and has a maximum output power of 12 dBm, whereas the second operates at 1.5 GHz and outputs a maximum of 6 dBm. The amplifiers have been characterized for use in two different polar transmitter architectures, Pulse Width Modulation by Variable Gate Bias (PWMVGB) and Envelope Elimination and Restoration (EER). Using a standard 130 nm digital CMOS process and off-chip passive components, maximum drain efficiencies of 32% and 39%, respectively, are achieved. The two amplifiers are compared with respect to output power and drain efficiency, including a qualitative analysis of losses. Moreover, their use in the two polar transmitter architectures is discussed.
  • Keywords
    CMOS digital integrated circuits; UHF integrated circuits; UHF power amplifiers; invertors; passive networks; power integrated circuits; pulse width modulation; radio transmitters; CMOS class-D RF power amplifier; CMOS inverter chains; digital CMOS process; envelope elimination; envelope restoration; frequency 1 GHz; frequency 1.5 GHz; off-chip passive components; polar transmitter architecture; pulse width modulation; size 130 nm; variable gate bias; Power amplifiers; Power generation; Power measurement; Pulse amplifiers; Pulse width modulation; Pulse width modulation inverters; Radio frequency; Radiofrequency amplifiers; Space vector pulse width modulation; Transmitters;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-2185-5
  • Electronic_ISBN
    978-1-4244-2186-2
  • Type

    conf

  • DOI
    10.1109/ICSICT.2008.4734800
  • Filename
    4734800