Title :
Silicon micromachined K-band filters
Author :
Khandelwal, Sumit Kumar ; Bansal, Deepak ; Rangra, K.J.
Author_Institution :
Council of Sci. & Ind. Res., Central Electron. Eng. Res. Inst. (CSIR-CEERI), Pilani, India
Abstract :
This paper describes a substrate integrated waveguide (SIW) based filter at K band frequency on silicon substrate. TMAH etching is used to form the via-holes for SIW cavities. Simulations and comparison of TMAH and Deep reactive ion etching (DRIE) etched cavity has been presented. A micro- machined filter is made from rectangular cavities integrated into a silicon substrate and is fed by coplanar waveguide (CPW) transmission-lines through current probes. Simulated filter using TMAH etching shows insertion loss of 0.29dB and return loss of 21.96 dB.
Keywords :
coplanar waveguides; etching; microwave filters; passive filters; substrate integrated waveguides; CPW transmission-lines; DRIE; Deep reactive ion etching; K band frequency; SIW based filter; TMAH etching; coplanar waveguide; etched cavity; loss 0.29 dB; loss 21.96 dB; micromachined filter; probes; silicon micromachined K-band filters; silicon substrate; substrate integrated waveguide; Cavity resonators; Deep reactive ion etching (DRIE); Micromachined filters; Substrate integrated waveguide (SIW); Tetra methyl ammonium hydroxide (TMAH);
Conference_Titel :
Computing, Electronics and Electrical Technologies (ICCEET), 2012 International Conference on
Conference_Location :
Kumaracoil
Print_ISBN :
978-1-4673-0211-1
DOI :
10.1109/ICCEET.2012.6203817
