DocumentCode :
2153864
Title :
An asymmetrical lightly-doped source (ALDS) cell for virtual ground high density EPROMs
Author :
Yoshikawa, K. ; Mori, S. ; Narita, K. ; Arai, N. ; Ohshima, Y. ; Kaneko, Y. ; Araki, H.
Author_Institution :
Toshiba Corp., Kawasaki, Japan
fYear :
1988
fDate :
11-14 Dec. 1988
Firstpage :
432
Lastpage :
435
Abstract :
A novel EPROM (erasable programmable read-only memory) cell structure with asymmetrically doped source and drain junction suitable for virtual ground array architecture is described. The asymmetric cell nature eliminates a write disturbance of the adjacent cell in the write mode. In the read mode, the cell provides higher read current and substantial soft-write lifetime as a result of the selection of the lightly doped n/sup -/ region as the drain. The cell is implemented in virtual ground designs. A novel planarized process has been developed to improve the manufacturability. It is concluded that such scalable cell and array structures are promising for the next-generation high-density EPROMs in the 16-Mb regime.<>
Keywords :
PROM; VLSI; field effect integrated circuits; integrated circuit technology; integrated memory circuits; 16 Mbit; 16-Mb regime; ULSI; asymmetric cell nature; asymmetrical lightly-doped source; asymmetrically doped source and drain; cell structure; erasable programmable read-only memory; high density EPROMs; manufacturability; next-generation; planarized process; scalable cell; soft-write lifetime; virtual ground array architecture; virtual ground designs; Capacitance; Degradation; EPROM; Etching; Implants; Insulation; Isolation technology; Oxidation; Planarization; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1988. IEDM '88. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.1988.32848
Filename :
32848
Link To Document :
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