DocumentCode :
2154236
Title :
High performance micro-machined inductors on CMOS substrate
Author :
Weon, Dae-Hee ; Kim, Jeong-Il ; Jeon, Jong-Hyeok ; Mohammadi, Saeed ; Katehi, Linda P B
Author_Institution :
Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
fYear :
2005
fDate :
12-17 June 2005
Abstract :
Using a combination of micromachining and three-dimensional (3-D) processing technologies, we have designed, fabricated, and tested inductors on CMOS grade Si substrate (10∼20 Ω-cm resistivity) which exhibit very high quality factor and high resonant frequency. A 1.2 nH inductor in this process achieves a record high quality factor of ∼140 at 12GHz, with Q > 100 for frequencies between 8 to 20GHz. The technology to fabricate these inductors is based on one step deposition and electroplating of a stressed layered metal combination of Cr and Au and is fully compatible with CMOS technology.
Keywords :
CMOS integrated circuits; Q-factor; chromium; electroplating; gold; inductors; micromachining; silicon; 12 GHz; 3D processing technology; CMOS substrate; CMOS technology; CrAu; electroplating; high quality factor; metal combination; micro-machined inductors; micromachining; one step deposition; resonant frequency; CMOS process; CMOS technology; Chromium; Conductivity; Gold; Inductors; Micromachining; Q factor; Resonant frequency; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest, 2005 IEEE MTT-S International
ISSN :
01490-645X
Print_ISBN :
0-7803-8845-3
Type :
conf
DOI :
10.1109/MWSYM.2005.1516705
Filename :
1516705
Link To Document :
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