DocumentCode :
2155309
Title :
Dehydroxylation of UV fused silica slides via laser irradiation
Author :
Fernandes, A.J. ; Kane, D.M. ; Gong, B. ; Lamb, R.N.
Author_Institution :
Dept. of Phys., Macquarie Univ., Sydney, NSW, Australia
fYear :
2002
fDate :
11-13 Dec. 2002
Firstpage :
433
Lastpage :
436
Abstract :
Further advances have been made in the development and understanding of an ultraviolet (UV) laser treatment of fused silica glass. Hydroxyl groups present on the surface can be removed by the treatment. The surface hydroxyl groups affect the surface adhesion and performance of silica in catalysis, chromatography, photonics and microelectronics. This work shows that dehydroxylation via laser irradiation is a thermal process. An analysis technique using mass spectrometry has been developed to elucidate and avoid the effect of hydrocarbon contamination, allowing systematic measurements of dehydroxylation to be performed.
Keywords :
laser materials processing; silicon compounds; surface treatment; time of flight mass spectra; SiO2; UV fused silica slides; dehydroxylation; laser irradiation; mass spectrometry; surface hydroxyl groups; Adhesives; Glass; Hydrocarbons; Mass spectroscopy; Microelectronics; Performance analysis; Photonics; Silicon compounds; Surface contamination; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronic and Microelectronic Materials and Devices, 2002 Conference on
ISSN :
1097-2137
Print_ISBN :
0-7803-7571-8
Type :
conf
DOI :
10.1109/COMMAD.2002.1237283
Filename :
1237283
Link To Document :
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