DocumentCode :
2155778
Title :
Ultra thin metal films for transparent conductive layers
Author :
Giurgola, S. ; Vergani, P. ; Lucchi, F. ; Pruneri, V.
Author_Institution :
Avanex Corp., San Donato Milanese
fYear :
2007
fDate :
17-22 June 2007
Firstpage :
1
Lastpage :
1
Abstract :
Optoelectronic technology often asks for conductive materials transparent to optical radiation like transparent conducting oxides (TCOs). Transparent contacts can sensibly improve efficiency and integration of optoelectronic devices, opening the possibility for new concept designs. We have investigated the feasibility to realize uniform transparent electrodes by sputtering deposition of ultra-thin metal films. In order to have an optical transmittance >60% and low resistance, metal films should be continuous with a thickness below 100A. We have studied thin film properties of a selection of metals (nickel, aluminum, titanium, chromium) deposited with a batch sputtering system customized for process manufacturing. The final goal is to define an industrial technology for the realization of transparent metal electrodes.
Keywords :
electrodes; metallic thin films; optical films; optical materials; optoelectronic devices; sputter deposition; batch sputtering; industrial technology; optical transmittance; optoelectronic devices; process manufacturing; sputtering deposition; transparent conducting oxides; transparent conductive layers; transparent metal electrodes; ultra thin metal films; Aluminum; Conducting materials; Conductive films; Electrodes; Nickel; Optical films; Optical materials; Optical sensors; Optoelectronic devices; Sputtering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2007 and the International Quantum Electronics Conference. CLEOE-IQEC 2007. European Conference on
Conference_Location :
Munich
Print_ISBN :
978-1-4244-0931-0
Electronic_ISBN :
978-1-4244-0931-0
Type :
conf
DOI :
10.1109/CLEOE-IQEC.2007.4386181
Filename :
4386181
Link To Document :
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