Title :
Complementary DMOS/BiCMOS technology for power IC applications
Author :
Dolny, G. ; Goodman, L. ; Schade, O., Jr. ; Olmstead, J. ; Zazzu, V. ; Burns, T.
Author_Institution :
David Sarnoff Res. Center, Princeton, NJ, USA
Abstract :
A power integrated circuit technology capable of integrating complementary power double-diffused MOS (DMOS) output devices with high-performance BiCMOS analog and digital components is described. The PDMOS output device is incorporated to address the class of applications which require complementary power outputs, but for which lateral p-n-p bipolars or charge-pumped NDMOS transistors are unsuitable. Power DMOS characteristics are optimized by the use of a thin-well architecture with n+ and p+ polysilicon gate technology. Important features of the technology are area-competitive 80-120-V power DMOS with logic-level-compatible threshold voltages, fine-feature-size CMOS with nanosecond stage delays, high-accuracy bipolar capability, and oxide-isolated polysilicon diodes. The technology was used successfully to fabricate individual test devices: subcircuit elements such as inverters, ring oscillators, references, comparators, and op amps; and commercial circuit designs.<>
Keywords :
BIMOS integrated circuits; integrated circuit technology; power integrated circuits; 80 to 120 V; complementary DMOS/BiCMOS technology; complementary power outputs; double-diffused MOS; fine-feature-size CMOS; high-accuracy bipolar capability; logic-level-compatible threshold voltages; n/sup +/ poly-Si gate technology; nanosecond stage delays; oxide-isolated polysilicon diodes; p+ polysilicon gate technology; polycrystalline Si; power IC applications; power integrated circuit technology; thin-well architecture; BiCMOS integrated circuits; CMOS technology; Charge pumps; Circuit testing; Delay; Diodes; Integrated circuit technology; Inverters; Power integrated circuits; Threshold voltage;
Conference_Titel :
Electron Devices Meeting, 1988. IEDM '88. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
DOI :
10.1109/IEDM.1988.32931