Variable MEMS-based inductors fabricated from PECVD silicon nitride

Author

Dell, J.M. ; Winchester, K. ; Musca, C.A. ; Antoszewski, J. ; Faraone, L.

Author_Institution

Sch. of Electr., Electron. & Comput. Eng., Western Australia Univ., Crawley, WA, Australia

fYear

2002

fDate

11-13 Dec. 2002

Firstpage

567

Lastpage

570

Abstract

This paper presents the implementation of inductors for on-chip integration with RF electronics. The inductors were fabricated using silicon bulk micromachining to form a micro-electro-mechanical system (MEMS) that is free from eddy-current losses found in spiral inductors formed using conventional silicon processing. By using the fabrication approach developed here, the resulting inductors are electrically tunable with the application of low DC bias voltages.

Keywords

inductors; micromachining; micromechanical devices; plasma CVD; silicon compounds; PECVD silicon nitride; RF electronics; SiN; micro-electro-mechanical system; on-chip integration; silicon bulk micromachining; variable MEMS-based inductors; Consumer electronics; Costs; Fabrication; Inductors; Micromechanical devices; Photonics; Radio frequency; Silicon; Space technology; Spirals;

fLanguage

English

Publisher

ieee

Conference_Titel

Optoelectronic and Microelectronic Materials and Devices, 2002 Conference on

ISSN

1097-2137

Print_ISBN

0-7803-7571-8

Type

conf

DOI

10.1109/COMMAD.2002.1237315

Filename

1237315

Link To Document

https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2156162