Low-loss Rib Waveguides in Al2O3 Layers for Active Integrated Optical Devices

Author

Bradley, J.D.B. ; Ay, F. ; Wörhoff, K. ; Pollnau, M.

Author_Institution

Univ. of Twente, Enschede

fYear

2007

fDate

17-22 June 2007

Firstpage

1

Lastpage

1

Abstract

In this paper, both a reactive co-sputtering process resulting in high optical quality AI₂O₃ thin films and a reactive ion etching process for defining low-loss rib waveguide structures are presented. The refractive index non-uniformity and the material birefringence are found to be below the limits of the applied method. Optical loss as low as 0.3 and 0.11 dB/cm at 633 and 1523 nm wavelength, respectively, is demonstrated at deposition temperature of 550degC.

Keywords

aluminium compounds; birefringence; integrated optics; optical films; optical losses; optical waveguides; refractive index; sputter deposition; sputter etching; Al₂O₃; active integrated optical devices; birefringence; low-loss rib waveguides; optical loss; reactive cosputtering; reactive ion etching; refractive index; temperature 550 degC; thin films; wavelength 1523 nm; wavelength 633 nm; Artificial intelligence; Birefringence; Etching; Optical films; Optical materials; Optical refraction; Optical variables control; Optical waveguides; Particle beam optics; Refractive index;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2007 and the International Quantum Electronics Conference. CLEOE-IQEC 2007. European Conference on

Conference_Location

Munich

Print_ISBN

978-1-4244-0931-0

Electronic_ISBN

978-1-4244-0931-0

Type

conf

DOI

10.1109/CLEOE-IQEC.2007.4386203

Filename

4386203