DocumentCode
2156367
Title
Fabrication of high aspect ratio photonic crystal structures in lithium niobate
Author
Hartung, H. ; Kley, E.-B. ; Tünnermann, A. ; Gischkat, T. ; Schrempel, F.
Author_Institution
Friedrich Schiller Univ. Jena, Jena
fYear
2007
fDate
17-22 June 2007
Firstpage
1
Lastpage
1
Abstract
This article presents the ion beam etching technology for photonic crystal structures in lithium niobate. This new fabrication technique is able to create sub micrometer size elements in lithium niobate with a depth of up to 500 nm.
Keywords
etching; integrated optics; lithium compounds; optical fabrication; photonic crystals; LiNbO3; depth 500 nm; high aspect ratio structures; ion beam etching; lithium niobate; optical fabrication; photonic crystal; submicrometer size elements; Amorphous materials; Crystalline materials; Crystallization; Etching; Ion beams; Lithium niobate; Optical device fabrication; Photonic crystals; Physics; Solid state circuits;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2007 and the International Quantum Electronics Conference. CLEOE-IQEC 2007. European Conference on
Conference_Location
Munich
Print_ISBN
978-1-4244-0931-0
Electronic_ISBN
978-1-4244-0931-0
Type
conf
DOI
10.1109/CLEOE-IQEC.2007.4386206
Filename
4386206
Link To Document