Fabrication of nanostructured titania thin film at low temperature

Nanostructured titania (NST) is attracting more and more attention due to its porousness and high surface to volume ratio. A novel process to fabricate integrated NST thin film at low temperature (80-90°C) is presented. NST features were formed by oxidizing Ti films in aqueous hydrogen peroxide. The optimal conditions of aqueous oxidation are: 85°C, aqueous 10% H₂O₂ solution, 20 min of water bath time. Crack-free NST features of 100 ¿m × 100 ¿m were successfully fabricated. Two polymer masking materials, SU8 and Parylene, were proved to be compatible with this process, selective NST oxidation could be carried out at an ultra low temperature below 100°C.