Two-step photolithographic technique for laterally coupled hybrid polymer microring resonators

Author

Rezzonico, Daniele ; Guarino, Andrea ; Herzog, Christian ; Jazbinsek, Mojca ; Günter, Peter

Author_Institution

ETH Zurich (Swiss Fed. Inst. of Technol.), Zurich

fYear

2007

fDate

17-22 June 2007

Firstpage

1

Lastpage

1

Abstract

We propose a simple and fast two-step patterning technique that allows controlling the gap between rings and port waveguides in lateral couplers, as well as independently adjusting the height of the different waveguides. Despite the proximity mode exposure, inducing a strong diffraction of the UV light at the apertures on the mask, the patterning technique resulted very precise, with 0.30 mum wide gaps between the ports and the ring.

Keywords

integrated optics; micro-optomechanical devices; micromechanical resonators; optical couplers; optical fabrication; optical polymers; photolithography; laterally coupled hybrid polymer microring resonators; port waveguides; size 0.3 mum; two-step patterning technique; two-step photolithographic technique; Nonlinear optics; Optical coupling; Optical modulation; Optical polymers; Optical resonators; Optical ring resonators; Optical sensors; Optical waveguides; Resonance; Waveguide discontinuities;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2007 and the International Quantum Electronics Conference. CLEOE-IQEC 2007. European Conference on

Conference_Location

Munich

Print_ISBN

978-1-4244-0931-0

Electronic_ISBN

978-1-4244-0931-0

Type

conf

DOI

10.1109/CLEOE-IQEC.2007.4386241

Filename

4386241