Title :
Design for nanoscale patterning
Author_Institution :
UCLA, Los Angeles, CA, USA
Abstract :
Design and Lithography are co-developed Regularity (in all ways you can think of) is (almost) always helpful for patterning but can hurt density scaling Be prepared for increasingly unusual layout restrictions and electrical effects coming from lithography.
Keywords :
lithography; codeveloped regularity; density scaling; electrical effects; layout restrictions; lithography; nanoscale patterning design; Art; Companies; Layout; Manuals; Nanoscale devices; Performance evaluation; Systematics;
Conference_Titel :
Custom Integrated Circuits Conference (CICC), 2013 IEEE
Conference_Location :
San Jose, CA
DOI :
10.1109/CICC.2013.6658506
