DocumentCode
2157554
Title
Low-cost fabrication of millimeter-wave all-silicon high efficiency antenna
Author
Basha, Mohamed Ali ; Abdellatif, Ahmed ; Safavi-Naeini, Safieddin
Author_Institution
Center for Sensor Networks & Cellular Syst. (SNCS), Univ. of Tabuk, Tabuk, Saudi Arabia
fYear
2012
fDate
8-14 July 2012
Firstpage
1
Lastpage
2
Abstract
A fabrication process of high-efficiency low-cost all silicon antenna at the millimeter wave range of frequency is presented. The antenna fabrication is a multi-level deep reactive ion etching process of a high resistivity intrinsic silicon wafer. The new process provides a silicon-platform for integrated planar antenna. A fabricated antenna with two level of Si was tested at 77GHz with an efficiency of 91% using the proposed fabrication process.
Keywords
elemental semiconductors; millimetre wave antennas; planar antennas; silicon; sputter etching; Si; antenna fabrication process; frequency 77 GHz; high-resistivity intrinsic silicon wafer; integrated planar antenna; low-cost fabrication; millimeter wave all-silicon high-efficiency antenna; multilevel deep-reactive ion etching process; Antennas; Conductivity; Dielectrics; Educational institutions; Etching; Fabrication; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Antennas and Propagation Society International Symposium (APSURSI), 2012 IEEE
Conference_Location
Chicago, IL
ISSN
1522-3965
Print_ISBN
978-1-4673-0461-0
Type
conf
DOI
10.1109/APS.2012.6349172
Filename
6349172
Link To Document