DocumentCode :
2158506
Title :
Frequency-scalable SiGe bipolar RFIC front-end design
Author :
Shana´A, Osama ; Linscott, Ivan ; Tyler, Len
Author_Institution :
Dept. of Electr. Eng., Stanford Univ., CA, USA
fYear :
2000
fDate :
2000
Firstpage :
183
Lastpage :
186
Abstract :
A highly-optimized SiGe RF bipolar front-end design is proposed. The optimum noise figure (NFopt) of a bipolar device is introduced in contrast with the minimum noise figure (NFmin). An analytical method to design the low noise amplifier (LNA) at the optimum noise figure point is derived. The optimized LNA design scales linearly with frequency for multi-band RF front-end design. The optimization method is extended to the design of an improved Gilbert cell active mixer. The technique was demonstrated on a 1800 MHz SiGe bipolar RF front-end whose LNA achieves a 1.3 dB NF at a bias current of 4.5 mA while the mixer achieves a single-sideband noise figure (SSB NF) of 6.5 dB at only 4.8 mA
Keywords :
Ge-Si alloys; UHF amplifiers; UHF integrated circuits; UHF mixers; bipolar analogue integrated circuits; integrated circuit design; integrated circuit noise; semiconductor materials; 1.3 dB; 1800 MHz; 4.5 mA; 4.8 mA; 6.5 dB; Gilbert cell active mixer; SiGe; SiGe bipolar RFIC front-end design; frequency-scalable SiGe bipolar RFIC; low noise amplifier; multi-band RF front-end; optimization method; optimized LNA design; optimum noise figure; Design methodology; Germanium silicon alloys; Low-noise amplifiers; Noise figure; Noise measurement; Optimized production technology; Radio frequency; Radiofrequency amplifiers; Radiofrequency integrated circuits; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Custom Integrated Circuits Conference, 2000. CICC. Proceedings of the IEEE 2000
Conference_Location :
Orlando, FL
Print_ISBN :
0-7803-5809-0
Type :
conf
DOI :
10.1109/CICC.2000.852645
Filename :
852645
Link To Document :
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