DocumentCode :
2158785
Title :
Semiconductor layer transfer by anodic wafer bonding
Author :
Lee, T.H. ; Tong, Q.-Y. ; Hao, Y. L C ; Huang, L.-J. ; Gösele, U.
Author_Institution :
Sch. of Eng., Duke Univ., Durham, NC, USA
fYear :
1997
fDate :
6-9 Oct 1997
Firstpage :
40
Lastpage :
41
Abstract :
High quality and low cost single crystalline semiconductor on glass (SOG) wafers are highly desirable, e.g., for flat panel displays and solar cells (Si on glass), sensors (Ge on glass) and GaN growth (SiC on glass). SOG wafers can be realized by hydrogen implanted Si wafer bonding and layer splitting (“Smart Cut”) which saves the Si substrate and is an environmentally friendly technique. However, almost no information on the process design has been revealed. In this work we discuss the design guidelines for SOG preparation using anodic bonding and the layer splitting approach
Keywords :
flat panel displays; semiconductor thin films; silicon-on-insulator; solar cells; thermal stresses; wafer bonding; Ge; SOG wafers; Si; SiC; anodic wafer bonding; environmentally friendly technique; flat panel displays; layer splitting; process design; semiconductor layer transfer; sensors; smart cut; solar cells; Costs; Crystallization; Flat panel displays; Gallium nitride; Glass; Hydrogen; Photovoltaic cells; Silicon carbide; Substrates; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, 1997. Proceedings., 1997 IEEE International
Conference_Location :
Fish Camp, CA
ISSN :
1078-621X
Print_ISBN :
0-7803-3938-X
Type :
conf
DOI :
10.1109/SOI.1997.634922
Filename :
634922
Link To Document :
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