DocumentCode
2159016
Title
The role of spacer surface conditions in the scatter of charge accumulations in SF6
Author
Jing, T. ; Morshuis, P.H.F. ; Kreuger, F.H.
Author_Institution
Inst. of Stand. & Ind. Res., Singapore
Volume
1
fYear
1994
fDate
3-8 Jul 1994
Firstpage
274
Abstract
A cylindrical epoxy spacer with different surface roughnesses was stressed under +150 kV in SF6. It is found that artificial roughness has no significant influence on the charge accumulation. Influences come from the variation in the surface conditions of the spacer by roughening it artificially. An additional test also shows that the micro structure at the spacer surface is more responsible for the large scatter of charge accumulation than that at the electrodes
Keywords
Charge measurement; Dielectrics; Electrodes; Flashover; Permittivity; Rough surfaces; Scattering; Surface roughness; Surface treatment; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Properties and Applications of Dielectric Materials, 1994., Proceedings of the 4th International Conference on
Conference_Location
Brisbane, Qld.
Print_ISBN
0-7803-1307-0
Type
conf
DOI
10.1109/ICPADM.1994.413992
Filename
413992
Link To Document