Mirrors and anti-reflective surfaces in single crystal silicon by patterning of the silicon surface

Author

Hadzialic, Sanja ; Taklo, Maaike M. V.

Author_Institution

SINTEF ICT, Oslo, Norway

fYear

2013

fDate

18-22 Aug. 2013

Firstpage

65

Lastpage

66

Abstract

We present mirrors and anti-reflective (AR) surfaces based on micro-structuring of silicon. Compared to dielectric Bragg reflector mirrors and thin film AR-coatings these structures are thinner, result in less material stress, and are compatible with CMOS technology (all silicon). Our surface structures are optimized for the 7-14 μm wavelength range. Such structures have applications within fields of infrared imaging, alcoholmeters, and cooling and anesthesia gas-detectors.

Keywords

antireflection coatings; elemental semiconductors; mirrors; optical films; silicon; surface structure; CMOS technology; Si; alcoholmeters; anesthesia gas-detectors; antireflective surfaces; cooling; dielectric Bragg reflector mirrors; infrared imaging; material stress; microstructuring process; silicon surface patterning; single crystal silicon; surface structure; thin film AR-coatings; wavelength 7 mum to 14 mum; Detectors; Mirrors; Optical surface waves; Reflectivity; Silicon; Surface waves;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS and Nanophotonics (OMN), 2013 International Conference on

Conference_Location

Kanazawa

ISSN

2160-5033

Print_ISBN

978-1-4799-1512-5

Type

conf

DOI

10.1109/OMN.2013.6659061

Filename

6659061